Review



comsol multiphysics© software  (COMSOL Inc)

 
  • Logo
  • About
  • News
  • Press Release
  • Team
  • Advisors
  • Partners
  • Contact
  • Bioz Stars
  • Bioz vStars
    • 90
      Buy from Supplier

    Structured Review

    COMSOL Inc comsol multiphysics© software
    Comsol Multiphysics© Software, supplied by COMSOL Inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
    https://www.bioz.com/result/comsol multiphysics© software/product/COMSOL Inc
    Average 90 stars, based on 1 article reviews
    comsol multiphysics© software - by Bioz Stars, 2026-04
    90/100 stars

    Images



    Similar Products

    comsol multiphysics© software  (COMSOL Inc)
    90
    COMSOL Inc comsol multiphysics© software
    Comsol Multiphysics© Software, supplied by COMSOL Inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
    https://www.bioz.com/result/comsol multiphysics© software/product/COMSOL Inc
    Average 90 stars, based on 1 article reviews
    comsol multiphysics© software - by Bioz Stars, 2026-04
    90/100 stars
    		  Buy from Supplier
    comsol multiphysics©  (COMSOL Inc)
    90
    COMSOL Inc comsol multiphysics©
    Schematic of the CVD setup and growth of monolayer MoS 2 . (a) Schematic of the 3-zone furnace and experimental setup used for atmospheric pressure CVD (AP-CVD) of monolayer MoS 2 . (b) Schematic of the reactor geometry setup in COMSOL <t>Multiphysics©.</t> Heating zones are labeled as I, II and III, separated by insulation zones. Boundary conditions at reactor ends are indicated. S and MoO 3 powder precursors are placed in zones I and II, while the substrate is placed vertically in zone III. Carrier gas is introduced from the left and the reactor is in an ambient environment at t = 0. Schematics of slotted and non-slotted substrate configurations are shown in the lower panel. Optical microscopy images of CVD grown triangular monolayer MoS 2 on SiO 2 /Si for (c) slotted and (d) non-slotted configurations.
    Comsol Multiphysics©, supplied by COMSOL Inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
    https://www.bioz.com/result/comsol multiphysics©/product/COMSOL Inc
    Average 90 stars, based on 1 article reviews
    comsol multiphysics© - by Bioz Stars, 2026-04
    90/100 stars
    		  Buy from Supplier
    multiphysics© finite element model  (COMSOL Inc)
    90
    COMSOL Inc multiphysics© finite element model
    Schematic of the CVD setup and growth of monolayer MoS 2 . (a) Schematic of the 3-zone furnace and experimental setup used for atmospheric pressure CVD (AP-CVD) of monolayer MoS 2 . (b) Schematic of the reactor geometry setup in COMSOL <t>Multiphysics©.</t> Heating zones are labeled as I, II and III, separated by insulation zones. Boundary conditions at reactor ends are indicated. S and MoO 3 powder precursors are placed in zones I and II, while the substrate is placed vertically in zone III. Carrier gas is introduced from the left and the reactor is in an ambient environment at t = 0. Schematics of slotted and non-slotted substrate configurations are shown in the lower panel. Optical microscopy images of CVD grown triangular monolayer MoS 2 on SiO 2 /Si for (c) slotted and (d) non-slotted configurations.
    Multiphysics© Finite Element Model, supplied by COMSOL Inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
    https://www.bioz.com/result/multiphysics© finite element model/product/COMSOL Inc
    Average 90 stars, based on 1 article reviews
    multiphysics© finite element model - by Bioz Stars, 2026-04
    90/100 stars
    		  Buy from Supplier
    multiphysics© 5.5 software  (COMSOL Inc)
    90
    COMSOL Inc multiphysics© 5.5 software
    Schematic of the CVD setup and growth of monolayer MoS 2 . (a) Schematic of the 3-zone furnace and experimental setup used for atmospheric pressure CVD (AP-CVD) of monolayer MoS 2 . (b) Schematic of the reactor geometry setup in COMSOL <t>Multiphysics©.</t> Heating zones are labeled as I, II and III, separated by insulation zones. Boundary conditions at reactor ends are indicated. S and MoO 3 powder precursors are placed in zones I and II, while the substrate is placed vertically in zone III. Carrier gas is introduced from the left and the reactor is in an ambient environment at t = 0. Schematics of slotted and non-slotted substrate configurations are shown in the lower panel. Optical microscopy images of CVD grown triangular monolayer MoS 2 on SiO 2 /Si for (c) slotted and (d) non-slotted configurations.
    Multiphysics© 5.5 Software, supplied by COMSOL Inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
    https://www.bioz.com/result/multiphysics© 5.5 software/product/COMSOL Inc
    Average 90 stars, based on 1 article reviews
    multiphysics© 5.5 software - by Bioz Stars, 2026-04
    90/100 stars
    		  Buy from Supplier
    fem simulations comsol© multiphysics  (COMSOL Inc)
    90
    COMSOL Inc fem simulations comsol© multiphysics
    Schematic of the CVD setup and growth of monolayer MoS 2 . (a) Schematic of the 3-zone furnace and experimental setup used for atmospheric pressure CVD (AP-CVD) of monolayer MoS 2 . (b) Schematic of the reactor geometry setup in COMSOL <t>Multiphysics©.</t> Heating zones are labeled as I, II and III, separated by insulation zones. Boundary conditions at reactor ends are indicated. S and MoO 3 powder precursors are placed in zones I and II, while the substrate is placed vertically in zone III. Carrier gas is introduced from the left and the reactor is in an ambient environment at t = 0. Schematics of slotted and non-slotted substrate configurations are shown in the lower panel. Optical microscopy images of CVD grown triangular monolayer MoS 2 on SiO 2 /Si for (c) slotted and (d) non-slotted configurations.
    Fem Simulations Comsol© Multiphysics, supplied by COMSOL Inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
    https://www.bioz.com/result/fem simulations comsol© multiphysics/product/COMSOL Inc
    Average 90 stars, based on 1 article reviews
    fem simulations comsol© multiphysics - by Bioz Stars, 2026-04
    90/100 stars
    		  Buy from Supplier
    comsol© multiphysics 6.2  (COMSOL Inc)
    90
    COMSOL Inc comsol© multiphysics 6.2
    Schematic of the CVD setup and growth of monolayer MoS 2 . (a) Schematic of the 3-zone furnace and experimental setup used for atmospheric pressure CVD (AP-CVD) of monolayer MoS 2 . (b) Schematic of the reactor geometry setup in COMSOL <t>Multiphysics©.</t> Heating zones are labeled as I, II and III, separated by insulation zones. Boundary conditions at reactor ends are indicated. S and MoO 3 powder precursors are placed in zones I and II, while the substrate is placed vertically in zone III. Carrier gas is introduced from the left and the reactor is in an ambient environment at t = 0. Schematics of slotted and non-slotted substrate configurations are shown in the lower panel. Optical microscopy images of CVD grown triangular monolayer MoS 2 on SiO 2 /Si for (c) slotted and (d) non-slotted configurations.
    Comsol© Multiphysics 6.2, supplied by COMSOL Inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
    https://www.bioz.com/result/comsol© multiphysics 6.2/product/COMSOL Inc
    Average 90 stars, based on 1 article reviews
    comsol© multiphysics 6.2 - by Bioz Stars, 2026-04
    90/100 stars
    		  Buy from Supplier
    multiphysics© software  (COMSOL Inc)
    90
    COMSOL Inc multiphysics© software
    Schematic of the CVD setup and growth of monolayer MoS 2 . (a) Schematic of the 3-zone furnace and experimental setup used for atmospheric pressure CVD (AP-CVD) of monolayer MoS 2 . (b) Schematic of the reactor geometry setup in COMSOL <t>Multiphysics©.</t> Heating zones are labeled as I, II and III, separated by insulation zones. Boundary conditions at reactor ends are indicated. S and MoO 3 powder precursors are placed in zones I and II, while the substrate is placed vertically in zone III. Carrier gas is introduced from the left and the reactor is in an ambient environment at t = 0. Schematics of slotted and non-slotted substrate configurations are shown in the lower panel. Optical microscopy images of CVD grown triangular monolayer MoS 2 on SiO 2 /Si for (c) slotted and (d) non-slotted configurations.
    Multiphysics© Software, supplied by COMSOL Inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
    https://www.bioz.com/result/multiphysics© software/product/COMSOL Inc
    Average 90 stars, based on 1 article reviews
    multiphysics© software - by Bioz Stars, 2026-04
    90/100 stars
    		  Buy from Supplier
    comsol multiphysics© 5.3  (COMSOL Inc)
    90
    COMSOL Inc comsol multiphysics© 5.3
    Schematic of the CVD setup and growth of monolayer MoS 2 . (a) Schematic of the 3-zone furnace and experimental setup used for atmospheric pressure CVD (AP-CVD) of monolayer MoS 2 . (b) Schematic of the reactor geometry setup in COMSOL <t>Multiphysics©.</t> Heating zones are labeled as I, II and III, separated by insulation zones. Boundary conditions at reactor ends are indicated. S and MoO 3 powder precursors are placed in zones I and II, while the substrate is placed vertically in zone III. Carrier gas is introduced from the left and the reactor is in an ambient environment at t = 0. Schematics of slotted and non-slotted substrate configurations are shown in the lower panel. Optical microscopy images of CVD grown triangular monolayer MoS 2 on SiO 2 /Si for (c) slotted and (d) non-slotted configurations.
    Comsol Multiphysics© 5.3, supplied by COMSOL Inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
    https://www.bioz.com/result/comsol multiphysics© 5.3/product/COMSOL Inc
    Average 90 stars, based on 1 article reviews
    comsol multiphysics© 5.3 - by Bioz Stars, 2026-04
    90/100 stars
    		  Buy from Supplier
    multiphysics© software package  (COMSOL Inc)
    90
    COMSOL Inc multiphysics© software package
    Schematic of the CVD setup and growth of monolayer MoS 2 . (a) Schematic of the 3-zone furnace and experimental setup used for atmospheric pressure CVD (AP-CVD) of monolayer MoS 2 . (b) Schematic of the reactor geometry setup in COMSOL <t>Multiphysics©.</t> Heating zones are labeled as I, II and III, separated by insulation zones. Boundary conditions at reactor ends are indicated. S and MoO 3 powder precursors are placed in zones I and II, while the substrate is placed vertically in zone III. Carrier gas is introduced from the left and the reactor is in an ambient environment at t = 0. Schematics of slotted and non-slotted substrate configurations are shown in the lower panel. Optical microscopy images of CVD grown triangular monolayer MoS 2 on SiO 2 /Si for (c) slotted and (d) non-slotted configurations.
    Multiphysics© Software Package, supplied by COMSOL Inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
    https://www.bioz.com/result/multiphysics© software package/product/COMSOL Inc
    Average 90 stars, based on 1 article reviews
    multiphysics© software package - by Bioz Stars, 2026-04
    90/100 stars
    		  Buy from Supplier
    multiphysics r© interface  (COMSOL Inc)
    90
    COMSOL Inc multiphysics r© interface
    Schematic of the CVD setup and growth of monolayer MoS 2 . (a) Schematic of the 3-zone furnace and experimental setup used for atmospheric pressure CVD (AP-CVD) of monolayer MoS 2 . (b) Schematic of the reactor geometry setup in COMSOL <t>Multiphysics©.</t> Heating zones are labeled as I, II and III, separated by insulation zones. Boundary conditions at reactor ends are indicated. S and MoO 3 powder precursors are placed in zones I and II, while the substrate is placed vertically in zone III. Carrier gas is introduced from the left and the reactor is in an ambient environment at t = 0. Schematics of slotted and non-slotted substrate configurations are shown in the lower panel. Optical microscopy images of CVD grown triangular monolayer MoS 2 on SiO 2 /Si for (c) slotted and (d) non-slotted configurations.
    Multiphysics R© Interface, supplied by COMSOL Inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
    https://www.bioz.com/result/multiphysics r© interface/product/COMSOL Inc
    Average 90 stars, based on 1 article reviews
    multiphysics r© interface - by Bioz Stars, 2026-04
    90/100 stars
    		  Buy from Supplier

    Image Search Results


    Schematic of the CVD setup and growth of monolayer MoS 2 . (a) Schematic of the 3-zone furnace and experimental setup used for atmospheric pressure CVD (AP-CVD) of monolayer MoS 2 . (b) Schematic of the reactor geometry setup in COMSOL Multiphysics©. Heating zones are labeled as I, II and III, separated by insulation zones. Boundary conditions at reactor ends are indicated. S and MoO 3 powder precursors are placed in zones I and II, while the substrate is placed vertically in zone III. Carrier gas is introduced from the left and the reactor is in an ambient environment at t = 0. Schematics of slotted and non-slotted substrate configurations are shown in the lower panel. Optical microscopy images of CVD grown triangular monolayer MoS 2 on SiO 2 /Si for (c) slotted and (d) non-slotted configurations.

    Journal: Nanoscale Advances

    Article Title: Critical role of precursor flux in modulating nucleation density in 2D material synthesis revealed by a digital twin †

    doi: 10.1039/d5na00202h

    Figure Lengend Snippet: Schematic of the CVD setup and growth of monolayer MoS 2 . (a) Schematic of the 3-zone furnace and experimental setup used for atmospheric pressure CVD (AP-CVD) of monolayer MoS 2 . (b) Schematic of the reactor geometry setup in COMSOL Multiphysics©. Heating zones are labeled as I, II and III, separated by insulation zones. Boundary conditions at reactor ends are indicated. S and MoO 3 powder precursors are placed in zones I and II, while the substrate is placed vertically in zone III. Carrier gas is introduced from the left and the reactor is in an ambient environment at t = 0. Schematics of slotted and non-slotted substrate configurations are shown in the lower panel. Optical microscopy images of CVD grown triangular monolayer MoS 2 on SiO 2 /Si for (c) slotted and (d) non-slotted configurations.

    Article Snippet: We used COMSOL Multiphysics© to develop a coupled 3D model of gas-flow, precursor concentration, and temperature distribution for a realistic simulation of the CVD process.

    Techniques: Labeling, Insulation, Microscopy

    Schematic of the CVD setup and growth of monolayer MoS 2 . (a) Schematic of the 3-zone furnace and experimental setup used for atmospheric pressure CVD (AP-CVD) of monolayer MoS 2 . (b) Schematic of the reactor geometry setup in COMSOL Multiphysics©. Heating zones are labeled as I, II and III, separated by insulation zones. Boundary conditions at reactor ends are indicated. S and MoO 3 powder precursors are placed in zones I and II, while the substrate is placed vertically in zone III. Carrier gas is introduced from the left and the reactor is in an ambient environment at t = 0. Schematics of slotted and non-slotted substrate configurations are shown in the lower panel. Optical microscopy images of CVD grown triangular monolayer MoS 2 on SiO 2 /Si for (c) slotted and (d) non-slotted configurations.

    Journal: Nanoscale Advances

    Article Title: Critical role of precursor flux in modulating nucleation density in 2D material synthesis revealed by a digital twin †

    doi: 10.1039/d5na00202h

    Figure Lengend Snippet: Schematic of the CVD setup and growth of monolayer MoS 2 . (a) Schematic of the 3-zone furnace and experimental setup used for atmospheric pressure CVD (AP-CVD) of monolayer MoS 2 . (b) Schematic of the reactor geometry setup in COMSOL Multiphysics©. Heating zones are labeled as I, II and III, separated by insulation zones. Boundary conditions at reactor ends are indicated. S and MoO 3 powder precursors are placed in zones I and II, while the substrate is placed vertically in zone III. Carrier gas is introduced from the left and the reactor is in an ambient environment at t = 0. Schematics of slotted and non-slotted substrate configurations are shown in the lower panel. Optical microscopy images of CVD grown triangular monolayer MoS 2 on SiO 2 /Si for (c) slotted and (d) non-slotted configurations.

    Article Snippet: We create a COMSOL Multiphysics© finite element model by accounting for fluid flow dynamics, evaporation of chalcogen and metal oxide precursors, realistic substrate geometries, and temperature profiles.

    Techniques: Labeling, Insulation, Microscopy